Three targets RF magnetron sputtering coater CY-MSP300S-3RF
Intro
Three targets RF magnetron sputtering coater is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable.
Structures
There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
The device is equipped with three 300W RF power supply. The RF power supply can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.
This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Application:
The device can be used for preparing single or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like.
Compared with similar equipment, the threel-target magnetron sputtering coating machine is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing a material film in a laboratory.
Technical parameters:
Sample stage | Size:φ185mm Temperature control accuracy:±1℃ Heating temperature:Max 500℃ Rotate speed:1-20rpm adjustable |
Magnetron Sputtering target head | 2"×3 (1",2" optional) Water chiller:Circulating water chiller with flow rate of 10L/min |
Vacuum chamber | Chamber size:φ300mm×300mm Watch window:φ100mm Chamber material:Stainless steel Opening mode:Top cover open |
Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) |
Vacuum system | Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
Power configuration | RF power supply×3;Max output power:RF 300 W |
Other parameters | Supply voltage:AC220V,50Hz Overall size:600mm×650mm×1280mm Total power:2.5KW Total Weight:300kg |
Detail pictures
